4/2/08

Hafnium-based Intel® 45nm Process Technology


Hafnium-based Intel® 45nm Process Technology
Two words: relentless innovation. Using dramatically new materials including hafnium-based circuitry, new Intel® 45nm Hi-k metal gate silicon technology helps to dramatically increase processor energy efficiency and performance for an unprecedented computing experience.

With this breakthrough transistor technology, Intel is manufacturing serious advantage into every hafnium-based Intel 45nm Hi-k chip.These revolutionary new processors empower a more enjoyable computing experience for your gaming, multimedia and multitasking, at work, at home, and at play

3 comments:

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